CMC Materials

CMC Materials CMP Polishing Pads

Polyurethane and composite polishing pads engineered for CMP processes across semiconductor fab operations. Used in combination with CMC slurries to achieve target surface flatness and defectivity at production scale.

GitHub

Documentation

📖
Documentation
https://www.entegris.com/

API entry from apis.yml

apis.yml Raw ↑ 
aid: cmc-materials:cmp-polishing-pads
name: CMC Materials CMP Polishing Pads
tags:
- Semiconductors
- CMP
- Polishing Pads
humanURL: https://www.entegris.com/
properties:
- url: https://www.entegris.com/
  type: Documentation
description: Polyurethane and composite polishing pads engineered for CMP processes across semiconductor
  fab operations. Used in combination with CMC slurries to achieve target surface flatness and defectivity
  at production scale.